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日本YAMATO等離子清洗機PR500/510

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日本YAMATO等離子清洗機PR500/510

詳細介紹

日本YAMATO等離子清洗機PR500/510：

Gas Plasma Etcher

PR500/PR510

Model
500	510
Method
Barrel type of DP DP : direct plasma
High-frequency Output
Max.500W
Oscillating Frequency
13.56MHz
Reaction Chamber
?215×305mm

The PR500/510 isagasplasma device that is used widely for such applicationsasproductionof semiconductors and analysis work. Itboastsoutstandingoperability and safety, with an automatic tuningsystemas a standardcomponent and other features.

It has a compact design,withasmall-size HF generator and an oscillation sectionintegratedwitha portion of the chamber.
With the 215mm diameterlargecaliberchamber, the unit can process bigtestingsamples.

The gas plasmaequipment has a wide range ofapplications fromashing, etching,dry cleaning,etc.

Reaction Chamber	Control Panel
Withthe215mm diameter large caliberchamber	FORWARD/REFLECT indicatebydigital

Operation Flowchart

Piping System Diagram

Specifications

Model	PR500	PR510
Method	Barrel type of direct plasma
Controlpart
Highfrequency output	Max.500W
Oscillating frequency	13.56MHz
Outputimpedance	50Ω
Tuningmethod	Automatic tuning
Instrument	Output watt meter (0 to 600W) Reflected wave watt meter (0 to 300W) Vacuum gauge, thermocouple type Flow meter, needle valve integrated type, 2 sets
Timer	0.1sec. to 999h
Gasinlet	1/4"stainless steel, 2 inlet
Powersource (50/60Hz)	AC100/220V, single phase, 2 kVA
Reactionpart
Reactionchamber	Madeof quarts, φ215×305mm
Electrodestructure	Condenser type, 4-way split
Controlsystem	Autopressurereduction, auto leak valve	TouchpanelwithPLC control
Pipingmaterial	SUS,Teflon
Externaldimensions(W×D×Hmm)	438×520×760	520×630×760
Weight	Approx.38kg	Approx.60kg
StandardAccessories
	Connection cable :1completeset Vacuum grease : 1 pc. O-ring for reaction chamber:1pc.
OptionalAccessories
Frame for wafers, 2, 3,4,5, 6 inches Multipurposeangledframe Aluminum etchingtunnelStand